SrRuO3 under tensile strain: Thickness-dependent electronic and magnetic properties

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Hauptverfasser: Wakabayashi, Yuki K., Kobayashi, Masaki, Seki, Yuichi, Yamagami, Kohei, Takeda, Takahito, Ohkochi, Takuo, Taniyasu, Yoshitaka, Krockenberger, Yoshiharu, Yamamoto, Hideki
Format: Preprint
Veröffentlicht: 2024
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author Wakabayashi, Yuki K.
Kobayashi, Masaki
Seki, Yuichi
Yamagami, Kohei
Takeda, Takahito
Ohkochi, Takuo
Taniyasu, Yoshitaka
Krockenberger, Yoshiharu
Yamamoto, Hideki
author_facet Wakabayashi, Yuki K.
Kobayashi, Masaki
Seki, Yuichi
Yamagami, Kohei
Takeda, Takahito
Ohkochi, Takuo
Taniyasu, Yoshitaka
Krockenberger, Yoshiharu
Yamamoto, Hideki
contents The burgeoning fields of spintronics and topological electronics require materials possessing a unique combination of properties: ferromagnetism, metallicity, and chemical stability. SrRuO3 (SRO) stands out as a compelling candidate due to its exceptional combination of these attributes. However, understanding its behavior under tensile strain, especially its thickness-dependent changes, remains elusive. This study employs machine-learning-assisted molecular beam epitaxy to investigate SRO films with thicknesses from 1 to 10 nm. This work complements the existing focus on compressive-strained SRO, opening a new avenue for exploring its hitherto concealed potential. Using soft X-ray magnetic circular dichroism, we uncover an intriguing interplay between film thickness, electronic structure, and magnetic properties. Our key findings reveal an intensified localization of Ru 4d t2g-O 2p hybridized states at lower thicknesses, attributed to the weakened orbital hybridization. Furthermore, we find a progressive reduction of magnetic moments for both Ru and O ions as film thickness decreases. Notably, a non-ferromagnetic insulating state emerges at a critical thickness of 1 nm, marking a pivotal transition from the metallic ferromagnetic phase. These insights emphasize the importance of considering thickness-dependent properties when tailoring SRO for next-generation spintronic and topological electronic devices.
format Preprint
id arxiv_https___arxiv_org_abs_2404_05438
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle SrRuO3 under tensile strain: Thickness-dependent electronic and magnetic properties
Wakabayashi, Yuki K.
Kobayashi, Masaki
Seki, Yuichi
Yamagami, Kohei
Takeda, Takahito
Ohkochi, Takuo
Taniyasu, Yoshitaka
Krockenberger, Yoshiharu
Yamamoto, Hideki
Materials Science
The burgeoning fields of spintronics and topological electronics require materials possessing a unique combination of properties: ferromagnetism, metallicity, and chemical stability. SrRuO3 (SRO) stands out as a compelling candidate due to its exceptional combination of these attributes. However, understanding its behavior under tensile strain, especially its thickness-dependent changes, remains elusive. This study employs machine-learning-assisted molecular beam epitaxy to investigate SRO films with thicknesses from 1 to 10 nm. This work complements the existing focus on compressive-strained SRO, opening a new avenue for exploring its hitherto concealed potential. Using soft X-ray magnetic circular dichroism, we uncover an intriguing interplay between film thickness, electronic structure, and magnetic properties. Our key findings reveal an intensified localization of Ru 4d t2g-O 2p hybridized states at lower thicknesses, attributed to the weakened orbital hybridization. Furthermore, we find a progressive reduction of magnetic moments for both Ru and O ions as film thickness decreases. Notably, a non-ferromagnetic insulating state emerges at a critical thickness of 1 nm, marking a pivotal transition from the metallic ferromagnetic phase. These insights emphasize the importance of considering thickness-dependent properties when tailoring SRO for next-generation spintronic and topological electronic devices.
title SrRuO3 under tensile strain: Thickness-dependent electronic and magnetic properties
topic Materials Science
url https://arxiv.org/abs/2404.05438