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Using a coupled optical and electrical monitoring method to follow the R-HiPIMS TiO$_2$ deposition process drifts

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Bibliographic Details
Main Authors:	Boivin, D, Jean-Marie-Désirée, R, Najah, A, Cuynet, S, de Poucques, L
Format:	Preprint
Published:	2024
Subjects:	Plasma Physics
Online Access:	Acceder al recurso
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