Overlapping Top Gate Electrodes based on Low Temperature Atomic Layer Deposition for Nanoscale Ambipolar Lateral Junctions

Fuente: arXiv

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Bibliographic Details
Main Authors:	Fuchs, Christopher, Fürst, Lena, Buhmann, Hartmut, Kleinlein, Johannes, Molenkamp, Laurens W.
Format:	Preprint
Published:	2024
Subjects:	Mesoscale and Nanoscale Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2404.06914