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Overlapping Top Gate Electrodes based on Low Temperature Atomic Layer Deposition for Nanoscale Ambipolar Lateral Junctions

Fuente: arXiv

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Detalles Bibliográficos
Autores principales:	Fuchs, Christopher, Fürst, Lena, Buhmann, Hartmut, Kleinlein, Johannes, Molenkamp, Laurens W.
Formato:	Preprint
Publicado:	2024
Materias:	Mesoscale and Nanoscale Physics
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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