Effect of the atomic structure of complexions on the active disconnection mode during shear-coupled grain boundary motion

Fuente: arXiv

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Bibliographic Details
Main Authors:	Pemma, Swetha, Janisch, Rebecca, Dehm, Gerhard, Brink, Tobias
Format:	Preprint
Published:	2024
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2404.13126