Time-Gated Optical Spectroscopy of Field-Effect Stimulated Recombination via Interfacial Point Defects in Fully-Processed Silicon Carbide Power MOSFETs

Fuente: arXiv
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Autori principali: Feil, Maximilian W., Weger, Magdalena, Reisinger, Hans, Aichinger, Thomas, Kabakow, André, Waldhör, Dominic, Jakowetz, Andreas C., Prigann, Sven, Pobegen, Gregor, Gustin, Wolfgang, Waltl, Michael, Bockstedte, Michel, Grasser, Tibor
Natura: Preprint
Pubblicazione: 2024
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author Feil, Maximilian W.
Weger, Magdalena
Reisinger, Hans
Aichinger, Thomas
Kabakow, André
Waldhör, Dominic
Jakowetz, Andreas C.
Prigann, Sven
Pobegen, Gregor
Gustin, Wolfgang
Waltl, Michael
Bockstedte, Michel
Grasser, Tibor
author_facet Feil, Maximilian W.
Weger, Magdalena
Reisinger, Hans
Aichinger, Thomas
Kabakow, André
Waldhör, Dominic
Jakowetz, Andreas C.
Prigann, Sven
Pobegen, Gregor
Gustin, Wolfgang
Waltl, Michael
Bockstedte, Michel
Grasser, Tibor
contents Fully-processed SiC power metal-oxide-semiconductor field-effect transistors (MOSFETs) emit light during switching of the gate terminal, while both drain and source terminals are grounded. The emitted photons are caused by defect-assisted recombination of electrons and holes at the 4H-SiC/SiO$_2$ interface and can be detected through the SiC substrate. Here, we present time-gated spectroscopic characterization of these interfacial point defects. Unlike in previous studies, the devices were opened in such a way that the drain-contact remained electrically active. A separate examination of the photons emitted at the rising and falling transitions of the gate-source voltage enabled the extraction of two different spectral components. One of these components consists of a single transition with phonon replicas of a local vibrational mode (LVM) with an astonishingly high energy of 220 meV $\unicode{x2013}$ well above the highest phonon modes in 4H-SiC and SiO$_2$ of 120 meV and 137 meV, respectively. Based on a quantum mechanical model, we successfully fitted its emission spectrum and assigned it to donor-acceptor pair recombination involving a carbon cluster-like defect. Other transitions were assigned to EH$_{6/7}$-assisted, EK$_2$-D, and nitrogen-aluminum donor-acceptor pair recombination. Due to the relevance of these defects in the operation of SiC MOSFETs, these novel insights will contribute to improved reliability and performance of these devices.
format Preprint
id arxiv_https___arxiv_org_abs_2404_13463
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Time-Gated Optical Spectroscopy of Field-Effect Stimulated Recombination via Interfacial Point Defects in Fully-Processed Silicon Carbide Power MOSFETs
Feil, Maximilian W.
Weger, Magdalena
Reisinger, Hans
Aichinger, Thomas
Kabakow, André
Waldhör, Dominic
Jakowetz, Andreas C.
Prigann, Sven
Pobegen, Gregor
Gustin, Wolfgang
Waltl, Michael
Bockstedte, Michel
Grasser, Tibor
Applied Physics
Fully-processed SiC power metal-oxide-semiconductor field-effect transistors (MOSFETs) emit light during switching of the gate terminal, while both drain and source terminals are grounded. The emitted photons are caused by defect-assisted recombination of electrons and holes at the 4H-SiC/SiO$_2$ interface and can be detected through the SiC substrate. Here, we present time-gated spectroscopic characterization of these interfacial point defects. Unlike in previous studies, the devices were opened in such a way that the drain-contact remained electrically active. A separate examination of the photons emitted at the rising and falling transitions of the gate-source voltage enabled the extraction of two different spectral components. One of these components consists of a single transition with phonon replicas of a local vibrational mode (LVM) with an astonishingly high energy of 220 meV $\unicode{x2013}$ well above the highest phonon modes in 4H-SiC and SiO$_2$ of 120 meV and 137 meV, respectively. Based on a quantum mechanical model, we successfully fitted its emission spectrum and assigned it to donor-acceptor pair recombination involving a carbon cluster-like defect. Other transitions were assigned to EH$_{6/7}$-assisted, EK$_2$-D, and nitrogen-aluminum donor-acceptor pair recombination. Due to the relevance of these defects in the operation of SiC MOSFETs, these novel insights will contribute to improved reliability and performance of these devices.
title Time-Gated Optical Spectroscopy of Field-Effect Stimulated Recombination via Interfacial Point Defects in Fully-Processed Silicon Carbide Power MOSFETs
topic Applied Physics
url https://arxiv.org/abs/2404.13463