Chemically Stable Group IV-V Transition Metal Carbide Thin Films in Hydrogen Radical Environments

Fuente: arXiv

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Bibliographic Details
Main Authors:	Rehman, Abdul, van de Kruijs, Robbert W. E., Beld, Wesley T. E. van den, Sturm, Jacobus M., Ackermann, Marcelo
Format:	Preprint
Published:	2024
Subjects:	Materials Science Applied Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2404.14108