Cita APA (7a ed.)

Huang, T., Lin, S., Zou, J., Wang, Z., Zhong, Y., Li, J., . . . Zhang, X. (2024). Physical Vapor Deposition of High Mobility P-type Tellurium and its Applications for Gate-tunable van der Waals PN Photodiodes.

Cita Chicago Style (17a ed.)

Huang, Tianyi, et al. Physical Vapor Deposition of High Mobility P-type Tellurium and Its Applications for Gate-tunable Van Der Waals PN Photodiodes. 2024.

Cita MLA (9a ed.)

Huang, Tianyi, et al. Physical Vapor Deposition of High Mobility P-type Tellurium and Its Applications for Gate-tunable Van Der Waals PN Photodiodes. 2024.

Precaución: Estas citas no son 100% exactas.