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Physical Vapor Deposition of High Mobility P-type Tellurium and its Applications for Gate-tunable van der Waals PN Photodiodes

Fuente: arXiv

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Dettagli Bibliografici
Autori principali:	Huang, Tianyi, Lin, Sen, Zou, Jingyi, Wang, Zexiao, Zhong, Yibai, Li, Jingwei, Wang, Ruixuan, Wang, Han, Li, Qing, Xu, Min, Shen, Sheng, Zhang, Xu
Natura:	Preprint
Pubblicazione:	2024
Soggetti:	Applied Physics
Accesso online:	Acceder al recurso
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