Impact of Top SiO2 interlayer Thickness on Memory Window of Si Channel FeFET with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS) Gate Structure
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| Main Authors: | , , , , , , , , , , , , , , , |
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| Format: | Preprint |
| Published: |
2024
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| Subjects: | |
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| _version_ | 1866913327962128384 |
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| author | Hu, Tao Shao, Xianzhou Bai, Mingkai Jia, Xinpei Dai, Saifei Sun, Xiaoqing Han, Runhao Yang, Jia Ke, Xiaoyu Tian, Fengbin Yang, Shuai Chai, Junshuai Xu, Hao Wang, Xiaolei Wang, Wenwu Ye, Tianchun |
| author_facet | Hu, Tao Shao, Xianzhou Bai, Mingkai Jia, Xinpei Dai, Saifei Sun, Xiaoqing Han, Runhao Yang, Jia Ke, Xiaoyu Tian, Fengbin Yang, Shuai Chai, Junshuai Xu, Hao Wang, Xiaolei Wang, Wenwu Ye, Tianchun |
| contents | We study the impact of top SiO2 interlayer thickness on memory window of Si channel FeFET with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS) gate structure. The memory window increases with thicker top SiO2. We realize the memory window of 6.3 V for 3.4 nm top SiO2. Moreover, we find that the endurance characteristic degrades with increasing the initial memory window. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2404_15825 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Impact of Top SiO2 interlayer Thickness on Memory Window of Si Channel FeFET with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS) Gate Structure Hu, Tao Shao, Xianzhou Bai, Mingkai Jia, Xinpei Dai, Saifei Sun, Xiaoqing Han, Runhao Yang, Jia Ke, Xiaoyu Tian, Fengbin Yang, Shuai Chai, Junshuai Xu, Hao Wang, Xiaolei Wang, Wenwu Ye, Tianchun Applied Physics We study the impact of top SiO2 interlayer thickness on memory window of Si channel FeFET with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS) gate structure. The memory window increases with thicker top SiO2. We realize the memory window of 6.3 V for 3.4 nm top SiO2. Moreover, we find that the endurance characteristic degrades with increasing the initial memory window. |
| title | Impact of Top SiO2 interlayer Thickness on Memory Window of Si Channel FeFET with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS) Gate Structure |
| topic | Applied Physics |
| url | https://arxiv.org/abs/2404.15825 |