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Main Authors: Wang, Fei, Lu, Kannan, Zhan, Huijuan, Ma, Lu, Wu, Feng, Sun, Hantao, Deng, Hao, Bai, Yang, Bao, Feng, Chang, Xu, Gao, Ran, Gao, Xun, Gong, Guicheng, Hu, Lijuan, Hu, Ruizi, Ji, Honghong, Ma, Xizheng, Mao, Liyong, Song, Zhijun, Tang, Chengchun, Wang, Hongcheng, Wang, Tenghui, Wang, Ziang, Xia, Tian, Xu, Hongxin, Zhan, Ze, Zhang, Gengyan, Zhou, Tao, Zhu, Mengyu, Zhu, Qingbin, Zhu, Shasha, Zhu, Xing, Shi, Yaoyun, Zhao, Hui-Hai, Deng, Chunqing
Format: Preprint
Published: 2024
Subjects:
Online Access:https://arxiv.org/abs/2405.05481
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author Wang, Fei
Lu, Kannan
Zhan, Huijuan
Ma, Lu
Wu, Feng
Sun, Hantao
Deng, Hao
Bai, Yang
Bao, Feng
Chang, Xu
Gao, Ran
Gao, Xun
Gong, Guicheng
Hu, Lijuan
Hu, Ruizi
Ji, Honghong
Ma, Xizheng
Mao, Liyong
Song, Zhijun
Tang, Chengchun
Wang, Hongcheng
Wang, Tenghui
Wang, Ziang
Xia, Tian
Xu, Hongxin
Zhan, Ze
Zhang, Gengyan
Zhou, Tao
Zhu, Mengyu
Zhu, Qingbin
Zhu, Shasha
Zhu, Xing
Shi, Yaoyun
Zhao, Hui-Hai
Deng, Chunqing
author_facet Wang, Fei
Lu, Kannan
Zhan, Huijuan
Ma, Lu
Wu, Feng
Sun, Hantao
Deng, Hao
Bai, Yang
Bao, Feng
Chang, Xu
Gao, Ran
Gao, Xun
Gong, Guicheng
Hu, Lijuan
Hu, Ruizi
Ji, Honghong
Ma, Xizheng
Mao, Liyong
Song, Zhijun
Tang, Chengchun
Wang, Hongcheng
Wang, Tenghui
Wang, Ziang
Xia, Tian
Xu, Hongxin
Zhan, Ze
Zhang, Gengyan
Zhou, Tao
Zhu, Mengyu
Zhu, Qingbin
Zhu, Shasha
Zhu, Xing
Shi, Yaoyun
Zhao, Hui-Hai
Deng, Chunqing
contents Fluxonium qubits are recognized for their high coherence times and high operation fidelities, attributed to their unique design incorporating a superinductor, which is typically implemented using an array of over 100 Josephson junctions. However, this complexity poses significant fabrication challenges, particularly in achieving high yield and junction uniformity with traditional methods. Here, we introduce an overlap process for Josephson junction fabrication that achieves nearly 100% yield and maintains uniformity across a 2-inch wafer with less than 5% variation for the phase slip junction and less than 2% for the entire junction array. We use a compact junction array design that achieves state-of-the-art dielectric loss tangents and flux noise levels, as confirmed by multiple devices. This enables fluxonium qubits to reach energy relaxation times exceeding 1 millisecond at the flux frustration point. This work paves the way for scalable high coherence fluxonium processors using CMOS-compatible processes, marking a significant step towards practical quantum computing.
format Preprint
id arxiv_https___arxiv_org_abs_2405_05481
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle High coherence fluxonium manufactured with a wafer-scale uniformity process
Wang, Fei
Lu, Kannan
Zhan, Huijuan
Ma, Lu
Wu, Feng
Sun, Hantao
Deng, Hao
Bai, Yang
Bao, Feng
Chang, Xu
Gao, Ran
Gao, Xun
Gong, Guicheng
Hu, Lijuan
Hu, Ruizi
Ji, Honghong
Ma, Xizheng
Mao, Liyong
Song, Zhijun
Tang, Chengchun
Wang, Hongcheng
Wang, Tenghui
Wang, Ziang
Xia, Tian
Xu, Hongxin
Zhan, Ze
Zhang, Gengyan
Zhou, Tao
Zhu, Mengyu
Zhu, Qingbin
Zhu, Shasha
Zhu, Xing
Shi, Yaoyun
Zhao, Hui-Hai
Deng, Chunqing
Quantum Physics
Fluxonium qubits are recognized for their high coherence times and high operation fidelities, attributed to their unique design incorporating a superinductor, which is typically implemented using an array of over 100 Josephson junctions. However, this complexity poses significant fabrication challenges, particularly in achieving high yield and junction uniformity with traditional methods. Here, we introduce an overlap process for Josephson junction fabrication that achieves nearly 100% yield and maintains uniformity across a 2-inch wafer with less than 5% variation for the phase slip junction and less than 2% for the entire junction array. We use a compact junction array design that achieves state-of-the-art dielectric loss tangents and flux noise levels, as confirmed by multiple devices. This enables fluxonium qubits to reach energy relaxation times exceeding 1 millisecond at the flux frustration point. This work paves the way for scalable high coherence fluxonium processors using CMOS-compatible processes, marking a significant step towards practical quantum computing.
title High coherence fluxonium manufactured with a wafer-scale uniformity process
topic Quantum Physics
url https://arxiv.org/abs/2405.05481