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Main Authors: Chen, Guojin, He, Hongquan, Xu, Peng, Geng, Hao, Yu, Bei
Format: Preprint
Published: 2024
Subjects:
Online Access:https://arxiv.org/abs/2405.09548
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author Chen, Guojin
He, Hongquan
Xu, Peng
Geng, Hao
Yu, Bei
author_facet Chen, Guojin
He, Hongquan
Xu, Peng
Geng, Hao
Yu, Bei
contents Resolution Enhancement Techniques (RETs) are critical to meet the demands of advanced technology nodes. Among RETs, Source Mask Optimization (SMO) is pivotal, concurrently optimizing both the source and the mask to expand the process window. Traditional SMO methods, however, are limited by sequential and alternating optimizations, leading to extended runtimes without performance guarantees. This paper introduces a unified SMO framework utilizing the accelerated Abbe forward imaging to enhance precision and efficiency. Further, we propose the innovative \texttt{BiSMO} framework, which reformulates SMO through a bilevel optimization approach, and present three gradient-based methods to tackle the challenges of bilevel SMO. Our experimental results demonstrate that \texttt{BiSMO} achieves a remarkable 40\% reduction in error metrics and 8$\times$ increase in runtime efficiency, signifying a major leap forward in SMO.
format Preprint
id arxiv_https___arxiv_org_abs_2405_09548
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Efficient Bilevel Source Mask Optimization
Chen, Guojin
He, Hongquan
Xu, Peng
Geng, Hao
Yu, Bei
Signal Processing
Resolution Enhancement Techniques (RETs) are critical to meet the demands of advanced technology nodes. Among RETs, Source Mask Optimization (SMO) is pivotal, concurrently optimizing both the source and the mask to expand the process window. Traditional SMO methods, however, are limited by sequential and alternating optimizations, leading to extended runtimes without performance guarantees. This paper introduces a unified SMO framework utilizing the accelerated Abbe forward imaging to enhance precision and efficiency. Further, we propose the innovative \texttt{BiSMO} framework, which reformulates SMO through a bilevel optimization approach, and present three gradient-based methods to tackle the challenges of bilevel SMO. Our experimental results demonstrate that \texttt{BiSMO} achieves a remarkable 40\% reduction in error metrics and 8$\times$ increase in runtime efficiency, signifying a major leap forward in SMO.
title Efficient Bilevel Source Mask Optimization
topic Signal Processing
url https://arxiv.org/abs/2405.09548