Wafer-scale fabrication of evacuated alkali vapor cells
Fuente:
arXiv
Saved in:
| Main Authors: | , , , , |
|---|---|
| Format: | Preprint |
| Published: |
2024
|
| Subjects: | |
| Online Access: | |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| _version_ | 1866914801762959360 |
|---|---|
| author | Li, Yang Sohn, Donggyu B. Hummon, Matthew Schima, Susan Kitching, John |
| author_facet | Li, Yang Sohn, Donggyu B. Hummon, Matthew Schima, Susan Kitching, John |
| contents | We describe a process for fabricating a wafer-scale array of alkali metal vapor cells with low residual gas pressure. We show that by etching long, thin channels between the cells on the Si wafer surface, the residual gas pressure in the evacuated vapor cell can be reduced to below 0.5 kPa (4 Torr) with a yield above 50 %. The low residual gas pressure in these mass-producible alkali vapor cells can enable a new generation of low-cost chip-scale atomic devices such as vapor cell optical clocks, wavelength references, and Rydberg sensors. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2405_11088 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Wafer-scale fabrication of evacuated alkali vapor cells Li, Yang Sohn, Donggyu B. Hummon, Matthew Schima, Susan Kitching, John Applied Physics Optics Quantum Physics We describe a process for fabricating a wafer-scale array of alkali metal vapor cells with low residual gas pressure. We show that by etching long, thin channels between the cells on the Si wafer surface, the residual gas pressure in the evacuated vapor cell can be reduced to below 0.5 kPa (4 Torr) with a yield above 50 %. The low residual gas pressure in these mass-producible alkali vapor cells can enable a new generation of low-cost chip-scale atomic devices such as vapor cell optical clocks, wavelength references, and Rydberg sensors. |
| title | Wafer-scale fabrication of evacuated alkali vapor cells |
| topic | Applied Physics Optics Quantum Physics |
| url | https://arxiv.org/abs/2405.11088 |