Preservation of Topological Surface States in Millimeter-Scale Transferred Membranes

Fuente: arXiv
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Main Authors: Ip, Chi Ian Jess, Gao, Qiang, Nguyen, Khanhy Du, Yan, Chenhui, Yan, Gangbin, Hoenig, Eli, Marchese, Thomas S., Zhang, Minghao, Lee, Woojoo, Rokni, Hossein, Meng, Ying Shirley, Liu, Chong, Yang, Shuolong
Format: Preprint
Published: 2024
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author Ip, Chi Ian Jess
Gao, Qiang
Nguyen, Khanhy Du
Yan, Chenhui
Yan, Gangbin
Hoenig, Eli
Marchese, Thomas S.
Zhang, Minghao
Lee, Woojoo
Rokni, Hossein
Meng, Ying Shirley
Liu, Chong
Yang, Shuolong
author_facet Ip, Chi Ian Jess
Gao, Qiang
Nguyen, Khanhy Du
Yan, Chenhui
Yan, Gangbin
Hoenig, Eli
Marchese, Thomas S.
Zhang, Minghao
Lee, Woojoo
Rokni, Hossein
Meng, Ying Shirley
Liu, Chong
Yang, Shuolong
contents Ultrathin topological insulator membranes are building blocks of exotic quantum matter. However, traditional epitaxy of these materials does not facilitate stacking in arbitrary orders, while mechanical exfoliation from bulk crystals is also challenging due to the non-negligible interlayer coupling therein. Here we liberate millimeter-scale films of topological insulator Bi$_2$Se$_3$, grown by molecular beam epitaxy, down to 3 quintuple layers. We characterize the preservation of the topological surface states and quantum well states in transferred Bi$_{2}$Se$_{3}$ films using angle-resolved photoemission spectroscopy. Leveraging the photon-energy-dependent surface sensitivity, the photoemission spectra taken with $6$ eV and $21.2$ eV photons reveal a transfer-induced migration of the topological surface states from the top to the inner layers. By establishing clear electronic structures of the transferred films and unveiling the wavefunction relocation of the topological surface states, our work paves the physics foundation crucial for the future fabrication of artificially stacked topological materials with single-layer precision.
format Preprint
id arxiv_https___arxiv_org_abs_2405_13228
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Preservation of Topological Surface States in Millimeter-Scale Transferred Membranes
Ip, Chi Ian Jess
Gao, Qiang
Nguyen, Khanhy Du
Yan, Chenhui
Yan, Gangbin
Hoenig, Eli
Marchese, Thomas S.
Zhang, Minghao
Lee, Woojoo
Rokni, Hossein
Meng, Ying Shirley
Liu, Chong
Yang, Shuolong
Materials Science
Mesoscale and Nanoscale Physics
Ultrathin topological insulator membranes are building blocks of exotic quantum matter. However, traditional epitaxy of these materials does not facilitate stacking in arbitrary orders, while mechanical exfoliation from bulk crystals is also challenging due to the non-negligible interlayer coupling therein. Here we liberate millimeter-scale films of topological insulator Bi$_2$Se$_3$, grown by molecular beam epitaxy, down to 3 quintuple layers. We characterize the preservation of the topological surface states and quantum well states in transferred Bi$_{2}$Se$_{3}$ films using angle-resolved photoemission spectroscopy. Leveraging the photon-energy-dependent surface sensitivity, the photoemission spectra taken with $6$ eV and $21.2$ eV photons reveal a transfer-induced migration of the topological surface states from the top to the inner layers. By establishing clear electronic structures of the transferred films and unveiling the wavefunction relocation of the topological surface states, our work paves the physics foundation crucial for the future fabrication of artificially stacked topological materials with single-layer precision.
title Preservation of Topological Surface States in Millimeter-Scale Transferred Membranes
topic Materials Science
Mesoscale and Nanoscale Physics
url https://arxiv.org/abs/2405.13228