StyleX: A Trainable Metric for X-ray Style Distances

Fuente: arXiv

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Bibliographic Details
Main Authors:	Eckert, Dominik, Syben, Christopher, Hümmer, Christian, Ritschl, Ludwig, Kappler, Steffen, Stober, Sebastian
Format:	Preprint
Published:	2024
Subjects:	Computer Vision and Pattern Recognition Artificial Intelligence
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2405.14718