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| Main Authors: | , , , , , , , , , , , , , , , , , , |
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| Format: | Preprint |
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2024
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| Subjects: | |
| Online Access: | https://arxiv.org/abs/2405.20597 |
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| _version_ | 1866929367818436608 |
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| author | Park, Joon Young Shin, Young Jae Shin, Jeacheol Kim, Jehyun Jo, Janghyun Yoo, Hyobin Haei, Danial Hyun, Chohee Yun, Jiyoung Huber, Robert M. Gupta, Arijit Watanabe, Kenji Taniguchi, Takashi Park, Wan Kyu Shin, Hyeon Suk Kim, Miyoung Kim, Dohun Yi, Gyu-Chul Kim, Philip |
| author_facet | Park, Joon Young Shin, Young Jae Shin, Jeacheol Kim, Jehyun Jo, Janghyun Yoo, Hyobin Haei, Danial Hyun, Chohee Yun, Jiyoung Huber, Robert M. Gupta, Arijit Watanabe, Kenji Taniguchi, Takashi Park, Wan Kyu Shin, Hyeon Suk Kim, Miyoung Kim, Dohun Yi, Gyu-Chul Kim, Philip |
| contents | Atomically thin van der Waals (vdW) films provide a novel material platform for epitaxial growth of quantum heterostructures. However, unlike the remote epitaxial growth of three-dimensional bulk crystals, the growth of two-dimensional (2D) material heterostructures across atomic layers has been limited due to the weak vdW interaction. Here, we report the double-sided epitaxy of vdW layered materials through atomic membranes. We grow vdW topological insulators (TIs) Sb$_2$Te$_3$ and Bi$_2$Se$_3$ by molecular beam epitaxy on both surfaces of atomically thin graphene or hBN, which serve as suspended 2D vdW "$\textit{substrate}$" layers. Both homo- and hetero- double-sided vdW TI tunnel junctions are fabricated, with the atomically thin hBN acting as a crystal-momentum-conserving tunnelling barrier with abrupt and epitaxial interface. By performing field-angle dependent magneto-tunnelling spectroscopy on these devices, we reveal the energy-momentum-spin resonant tunnelling of massless Dirac electrons between helical Landau levels developed in the topological surface states at the interface. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2405_20597 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Double-sided van der Waals epitaxy of topological insulators across an atomically thin membrane Park, Joon Young Shin, Young Jae Shin, Jeacheol Kim, Jehyun Jo, Janghyun Yoo, Hyobin Haei, Danial Hyun, Chohee Yun, Jiyoung Huber, Robert M. Gupta, Arijit Watanabe, Kenji Taniguchi, Takashi Park, Wan Kyu Shin, Hyeon Suk Kim, Miyoung Kim, Dohun Yi, Gyu-Chul Kim, Philip Materials Science Mesoscale and Nanoscale Physics Atomically thin van der Waals (vdW) films provide a novel material platform for epitaxial growth of quantum heterostructures. However, unlike the remote epitaxial growth of three-dimensional bulk crystals, the growth of two-dimensional (2D) material heterostructures across atomic layers has been limited due to the weak vdW interaction. Here, we report the double-sided epitaxy of vdW layered materials through atomic membranes. We grow vdW topological insulators (TIs) Sb$_2$Te$_3$ and Bi$_2$Se$_3$ by molecular beam epitaxy on both surfaces of atomically thin graphene or hBN, which serve as suspended 2D vdW "$\textit{substrate}$" layers. Both homo- and hetero- double-sided vdW TI tunnel junctions are fabricated, with the atomically thin hBN acting as a crystal-momentum-conserving tunnelling barrier with abrupt and epitaxial interface. By performing field-angle dependent magneto-tunnelling spectroscopy on these devices, we reveal the energy-momentum-spin resonant tunnelling of massless Dirac electrons between helical Landau levels developed in the topological surface states at the interface. |
| title | Double-sided van der Waals epitaxy of topological insulators across an atomically thin membrane |
| topic | Materials Science Mesoscale and Nanoscale Physics |
| url | https://arxiv.org/abs/2405.20597 |