Electron Confinement-Induced Plasmonic Breakdown in Metals

Fuente: arXiv
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Auteurs principaux: Das, Prasanna, Rudra, Sourav, Rao, Dheemahi, Banerjee, Souvik, Pillai, Ashalatha Indiradevi Kamalasanan, Garbrecht, Magnus, Boltasseva, Alexandra, Bondarev, Igor V., Shalaev, Vladimir M., Saha, Bivas
Format: Preprint
Publié: 2024
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author Das, Prasanna
Rudra, Sourav
Rao, Dheemahi
Banerjee, Souvik
Pillai, Ashalatha Indiradevi Kamalasanan
Garbrecht, Magnus
Boltasseva, Alexandra
Bondarev, Igor V.
Shalaev, Vladimir M.
Saha, Bivas
author_facet Das, Prasanna
Rudra, Sourav
Rao, Dheemahi
Banerjee, Souvik
Pillai, Ashalatha Indiradevi Kamalasanan
Garbrecht, Magnus
Boltasseva, Alexandra
Bondarev, Igor V.
Shalaev, Vladimir M.
Saha, Bivas
contents Plasmon resonance in metals represents the collective oscillation of the free electron gas density and enables enhanced light-matter interactions in nanoscale dimensions. Traditionally, the classical Drude model describes the plasmonic excitation, wherein the plasma frequency exhibits no spatial dispersion. Here, we show conclusive experimental evidence of the breakdown of the plasmon resonance and a consequent photonic metal-insulator transition in an ultrathin archetypal refractory plasmonic material, hafnium nitride (HfN). Epitaxial HfN thick films exhibit a low-loss and high-quality Drude-like plasmon resonance in the visible spectral range. However, as the film thickness is reduced to nanoscale dimensions, the Coulomb interaction among electrons increases due to the electron confinement, leading to the spatial dispersion of the plasma frequency. Importantly, with the further decrease in thickness, electrons lose their ability to shield the incident electric field, turning the medium into a dielectric. The breakdown of the plasmon resonance in epitaxial ultrathin metals could be useful for fundamental physics studies in transdimensional regimes and novel photonic device applications.
format Preprint
id arxiv_https___arxiv_org_abs_2406_03226
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Electron Confinement-Induced Plasmonic Breakdown in Metals
Das, Prasanna
Rudra, Sourav
Rao, Dheemahi
Banerjee, Souvik
Pillai, Ashalatha Indiradevi Kamalasanan
Garbrecht, Magnus
Boltasseva, Alexandra
Bondarev, Igor V.
Shalaev, Vladimir M.
Saha, Bivas
Optics
Materials Science
Plasmon resonance in metals represents the collective oscillation of the free electron gas density and enables enhanced light-matter interactions in nanoscale dimensions. Traditionally, the classical Drude model describes the plasmonic excitation, wherein the plasma frequency exhibits no spatial dispersion. Here, we show conclusive experimental evidence of the breakdown of the plasmon resonance and a consequent photonic metal-insulator transition in an ultrathin archetypal refractory plasmonic material, hafnium nitride (HfN). Epitaxial HfN thick films exhibit a low-loss and high-quality Drude-like plasmon resonance in the visible spectral range. However, as the film thickness is reduced to nanoscale dimensions, the Coulomb interaction among electrons increases due to the electron confinement, leading to the spatial dispersion of the plasma frequency. Importantly, with the further decrease in thickness, electrons lose their ability to shield the incident electric field, turning the medium into a dielectric. The breakdown of the plasmon resonance in epitaxial ultrathin metals could be useful for fundamental physics studies in transdimensional regimes and novel photonic device applications.
title Electron Confinement-Induced Plasmonic Breakdown in Metals
topic Optics
Materials Science
url https://arxiv.org/abs/2406.03226