Flexoelectricity in Amorphous Hafnium Oxide (HfO2)

Fuente: arXiv
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Main Authors: Moreno-Garcia, Daniel, Howell, Kaitlin M., Villanueva, Luis Guillermo
Format: Preprint
Published: 2024
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author Moreno-Garcia, Daniel
Howell, Kaitlin M.
Villanueva, Luis Guillermo
author_facet Moreno-Garcia, Daniel
Howell, Kaitlin M.
Villanueva, Luis Guillermo
contents Flexoelectricity, inherent in all materials, offers a promising alternative to piezoelectricity for nanoscale actuation and sensing. However, its widespread application faces significant challenges: differentiating flexoelectric effects from those of piezoelectricity and other phenomena, verifying its universality across all material structures and thicknesses, and establishing a comprehensive database of flexoelectric coefficients across different materials. This work introduces a groundbreaking methodology that accurately isolates flexoelectricity from piezoelectric, electrostrictive and electrostatic effects, with a detection threshold extending below 1 fC/m. The robustness of this method is demonstrated through its application to amorphous hafnium oxide (HfO$_2$), successfully measuring a flexoelectric coefficient of 105 $\pm$ 10 pC/m. This measurement signifies the first measurement of flexoelectricity in hafnia, as well as in any amorphous material. Additionally, the study compiles a list of published flexoelectric coefficients, revealing an important insight. The relationship between the flexoelectric coefficient and the material's relative permittivity is better approximated by a quadratic proportionality. This challenges the traditional linear assumption proposed in Kogan's work and opens new avenues for future research in flexoelectric materials.
format Preprint
id arxiv_https___arxiv_org_abs_2406_13382
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Flexoelectricity in Amorphous Hafnium Oxide (HfO2)
Moreno-Garcia, Daniel
Howell, Kaitlin M.
Villanueva, Luis Guillermo
Materials Science
Applied Physics
Flexoelectricity, inherent in all materials, offers a promising alternative to piezoelectricity for nanoscale actuation and sensing. However, its widespread application faces significant challenges: differentiating flexoelectric effects from those of piezoelectricity and other phenomena, verifying its universality across all material structures and thicknesses, and establishing a comprehensive database of flexoelectric coefficients across different materials. This work introduces a groundbreaking methodology that accurately isolates flexoelectricity from piezoelectric, electrostrictive and electrostatic effects, with a detection threshold extending below 1 fC/m. The robustness of this method is demonstrated through its application to amorphous hafnium oxide (HfO$_2$), successfully measuring a flexoelectric coefficient of 105 $\pm$ 10 pC/m. This measurement signifies the first measurement of flexoelectricity in hafnia, as well as in any amorphous material. Additionally, the study compiles a list of published flexoelectric coefficients, revealing an important insight. The relationship between the flexoelectric coefficient and the material's relative permittivity is better approximated by a quadratic proportionality. This challenges the traditional linear assumption proposed in Kogan's work and opens new avenues for future research in flexoelectric materials.
title Flexoelectricity in Amorphous Hafnium Oxide (HfO2)
topic Materials Science
Applied Physics
url https://arxiv.org/abs/2406.13382