APA (7th ed.) Citation

Mukherjee, S., Sitaram, S. R., Wang, X., & Law, S. (2024). Shadow Mask Molecular Beam Epitaxy for In-Plane Gradient Permittivity Materials.

Chicago Style (17th ed.) Citation

Mukherjee, S., S. R. Sitaram, X. Wang, and S. Law. Shadow Mask Molecular Beam Epitaxy for In-Plane Gradient Permittivity Materials. 2024.

MLA (9th ed.) Citation

Mukherjee, S., et al. Shadow Mask Molecular Beam Epitaxy for In-Plane Gradient Permittivity Materials. 2024.