Your Clean Graphene is Still Not Clean

Fuente: arXiv
Saved in:
Bibliographic Details
Main Authors: Dyck, Ondrej, Okmi, Aisha, Xiao, Kai, Lei, Sidong, Lupini, Andrew R., Jesse, Stephen
Format: Preprint
Published: 2024
Subjects:
Online Access:
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1866913592923652096
author Dyck, Ondrej
Okmi, Aisha
Xiao, Kai
Lei, Sidong
Lupini, Andrew R.
Jesse, Stephen
author_facet Dyck, Ondrej
Okmi, Aisha
Xiao, Kai
Lei, Sidong
Lupini, Andrew R.
Jesse, Stephen
contents Efforts aimed at scaling fabrication processes to the level of single atoms, dubbed atom-by-atom fabrication or atomic fabrication, invariably encounter the obstacle of atomic scale cleanliness. When considering atomic fabrication, cleanliness of the base material and purity of the source reservoir from which atomic structures will be built are invariable constraints imposed by laws of physics and chemistry. As obvious as such statements may be, and regardless of the inevitable consequences for successful atomic fabrication, there is a poignant lack of understanding of the "dirt" (contamination/impurities). Here, we examine hydrocarbon contamination on graphene. Graphene has formed the base substrate for many e-beam-based atomic fabrication studies and many strategies for cleaning graphene have been presented in the literature. One popular method is heating to high temperatures (>500 °C). It is usually inferred that volatile hydrocarbons evaporate into the microscope vacuum system leaving behind pristine graphene. Here, we show through direct image intensity analysis that what appears to be clean graphene can be coated with a thin layer of dynamically diffusing hydrocarbons. This result holds significant implications for approaches to e-beam based atomic fabrication, updates the conceptual model of e-beam induced hydrocarbon deposition, and may extend to hot surfaces generally.
format Preprint
id arxiv_https___arxiv_org_abs_2407_02642
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Your Clean Graphene is Still Not Clean
Dyck, Ondrej
Okmi, Aisha
Xiao, Kai
Lei, Sidong
Lupini, Andrew R.
Jesse, Stephen
Materials Science
Efforts aimed at scaling fabrication processes to the level of single atoms, dubbed atom-by-atom fabrication or atomic fabrication, invariably encounter the obstacle of atomic scale cleanliness. When considering atomic fabrication, cleanliness of the base material and purity of the source reservoir from which atomic structures will be built are invariable constraints imposed by laws of physics and chemistry. As obvious as such statements may be, and regardless of the inevitable consequences for successful atomic fabrication, there is a poignant lack of understanding of the "dirt" (contamination/impurities). Here, we examine hydrocarbon contamination on graphene. Graphene has formed the base substrate for many e-beam-based atomic fabrication studies and many strategies for cleaning graphene have been presented in the literature. One popular method is heating to high temperatures (>500 °C). It is usually inferred that volatile hydrocarbons evaporate into the microscope vacuum system leaving behind pristine graphene. Here, we show through direct image intensity analysis that what appears to be clean graphene can be coated with a thin layer of dynamically diffusing hydrocarbons. This result holds significant implications for approaches to e-beam based atomic fabrication, updates the conceptual model of e-beam induced hydrocarbon deposition, and may extend to hot surfaces generally.
title Your Clean Graphene is Still Not Clean
topic Materials Science
url https://arxiv.org/abs/2407.02642