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Decoupling NO production and UV emission intensity over the E-H mode transition in a low-pressure inductively coupled plasma device

Fuente: arXiv

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Detalles Bibliográficos
Autores principales:	Schücke, Lars, Segura, Angie Natalia Torres, Korolov, Ihor, Awakowicz, Peter, Gibson, Andrew R.
Formato:	Preprint
Publicado:	2024
Materias:	Plasma Physics
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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