Cryogenic Behavior of High-Permittivity Gate Dielectrics: The Impact of the Atomic Layer Deposition Temperature and the Lithographic Patterning Method

Fuente: arXiv

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Bibliographic Details
Main Authors:	Paghi, Alessandro, Battisti, Sebastiano, Tortorella, Simone, De Simoni, Giorgio, Giazotto, Francesco
Format:	Preprint
Published:	2024
Subjects:	Materials Science Mesoscale and Nanoscale Physics Superconductivity
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2407.04501