Cryogenic Behavior of High-Permittivity Gate Dielectrics: The Impact of the Atomic Layer Deposition Temperature and the Lithographic Patterning Method
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arXiv
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| Main Authors: | Paghi, Alessandro, Battisti, Sebastiano, Tortorella, Simone, De Simoni, Giorgio, Giazotto, Francesco |
|---|---|
| Format: | Preprint |
| Published: |
2024
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| Subjects: | |
| Online Access: | |
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