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Optimizing ToF-SIMS Depth Profiles of Semiconductor Heterostructures

Fuente: arXiv

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Détails bibliographiques
Auteurs principaux:	Tröger, Jan, Kersting, Reinhard, Hagenhoff, Birgit, Bougeard, Dominique, Abrosimov, Nikolay V., Klos, Jan, Schreiber, Lars R., Bracht, Hartmut
Format:	Preprint
Publié:	2024
Sujets:	Applied Physics Materials Science
Accès en ligne:	Acceder al recurso
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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