In Situ Growth of Copper Channels within CuCl and PVDF Composite for Durable WORM Device Formation

Fuente: arXiv

Saved in:

Bibliographic Details
Main Authors:	Bose, Shilpi, Sinha, Aloka, Ghosh, Santanu
Format:	Preprint
Published:	2024
Subjects:	Mesoscale and Nanoscale Physics
Online Access:	Acceder al recurso
Tags:	Add Tag No Tags, Be the first to tag this record!

Internet

https://arxiv.org/abs/2407.20687