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In Situ Growth of Copper Channels within CuCl and PVDF Composite for Durable WORM Device Formation

Fuente: arXiv

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Detalles Bibliográficos
Autores principales:	Bose, Shilpi, Sinha, Aloka, Ghosh, Santanu
Formato:	Preprint
Publicado:	2024
Materias:	Mesoscale and Nanoscale Physics
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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