Intermittent Semi-Working Mask: A New Masking Paradigm for LLMs

Fuente: arXiv

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Bibliographic Details
Main Authors:	Hu, HaoYuan, Lu, Mingcong, Luo, Di, Wu, XinYa, Zhu, Jiangcai, Yin, Taoye, Li, Zheng, Wang, Hao, Zhang, Shusheng, Zhang, KeZun, Shao, KaiLai, Chen, Chao, Wang, Feng
Format:	Preprint
Published:	2024
Subjects:	Computation and Language Artificial Intelligence
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2408.00539