In situ etching of \b{eta}-Ga2O3 using tert-butyl chloride in an MOCVD system

Fuente: arXiv

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Bibliographic Details
Main Authors:	Gorsak, Cameron A., Bowman, Henry J., Gann, Katie R., Buontempo, Joshua T., Smith, Kathleen T., Tripathi, Pushpanshu, Steele, Jacob, Jena, Debdeep, Schlom, Darrell G., Xing, Huili Grace, Thompson, Michael O., Nair, Hari P.
Format:	Preprint
Published:	2024
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2408.01574