Enhanced Superconducting Qubit Performance Through Ammonium Fluoride Etch

Fuente: arXiv
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Auteurs principaux: Kopas, Cameron J., Goronzy, Dominic P., Pham, Thang, Castanedo, Carlos G. Torres, Cheng, Matthew, Cochrane, Rory, Nast, Patrick, Lachman, Ella, Zhelev, Nikolay Z., Vallieres, Andre, Murthy, Akshay A., Oh, Jin-su, Zhou, Lin, Kramer, Matthew J., Cansizoglu, Hilal, Bedzyk, Michael J., Dravid, Vinayak P., Romanenko, Alexander, Grassellino, Anna, Mutus, Josh Y., Hersam, Mark C., Yadavalli, Kameshwar
Format: Preprint
Publié: 2024
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author Kopas, Cameron J.
Goronzy, Dominic P.
Pham, Thang
Castanedo, Carlos G. Torres
Cheng, Matthew
Cochrane, Rory
Nast, Patrick
Lachman, Ella
Zhelev, Nikolay Z.
Vallieres, Andre
Murthy, Akshay A.
Oh, Jin-su
Zhou, Lin
Kramer, Matthew J.
Cansizoglu, Hilal
Bedzyk, Michael J.
Dravid, Vinayak P.
Romanenko, Alexander
Grassellino, Anna
Mutus, Josh Y.
Hersam, Mark C.
Yadavalli, Kameshwar
author_facet Kopas, Cameron J.
Goronzy, Dominic P.
Pham, Thang
Castanedo, Carlos G. Torres
Cheng, Matthew
Cochrane, Rory
Nast, Patrick
Lachman, Ella
Zhelev, Nikolay Z.
Vallieres, Andre
Murthy, Akshay A.
Oh, Jin-su
Zhou, Lin
Kramer, Matthew J.
Cansizoglu, Hilal
Bedzyk, Michael J.
Dravid, Vinayak P.
Romanenko, Alexander
Grassellino, Anna
Mutus, Josh Y.
Hersam, Mark C.
Yadavalli, Kameshwar
contents The performance of superconducting qubits is often limited by dissipation and two-level systems (TLS) losses. The dominant sources of these losses are believed to originate from amorphous materials and defects at interfaces and surfaces, likely as a result of fabrication processes or ambient exposure. Here, we explore a novel wet chemical surface treatment at the Josephson junction-substrate and the substrate-air interfaces by replacing a buffered oxide etch (BOE) cleaning process with one that uses hydrofluoric acid followed by aqueous ammonium fluoride. We show that the ammonium fluoride etch process results in a statistically significant improvement in median $\text{T}_1$ by $\sim22\%$ ($p=0.002$), and a reduction in the number of strongly-coupled TLS in the tunable frequency range. Microwave resonator measurements on samples treated with the ammonium fluoride etch prior to niobium deposition also show $\sim33\%$ lower TLS-induced loss tangent compared to the BOE treated samples. As the chemical treatment primarily modifies the Josephson junction-substrate interface and substrate-air interface, we perform targeted chemical and structural characterizations to examine materials' differences at these interfaces and identify multiple microscopic changes that could contribute to decreased TLS.
format Preprint
id arxiv_https___arxiv_org_abs_2408_02863
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Enhanced Superconducting Qubit Performance Through Ammonium Fluoride Etch
Kopas, Cameron J.
Goronzy, Dominic P.
Pham, Thang
Castanedo, Carlos G. Torres
Cheng, Matthew
Cochrane, Rory
Nast, Patrick
Lachman, Ella
Zhelev, Nikolay Z.
Vallieres, Andre
Murthy, Akshay A.
Oh, Jin-su
Zhou, Lin
Kramer, Matthew J.
Cansizoglu, Hilal
Bedzyk, Michael J.
Dravid, Vinayak P.
Romanenko, Alexander
Grassellino, Anna
Mutus, Josh Y.
Hersam, Mark C.
Yadavalli, Kameshwar
Materials Science
Quantum Physics
The performance of superconducting qubits is often limited by dissipation and two-level systems (TLS) losses. The dominant sources of these losses are believed to originate from amorphous materials and defects at interfaces and surfaces, likely as a result of fabrication processes or ambient exposure. Here, we explore a novel wet chemical surface treatment at the Josephson junction-substrate and the substrate-air interfaces by replacing a buffered oxide etch (BOE) cleaning process with one that uses hydrofluoric acid followed by aqueous ammonium fluoride. We show that the ammonium fluoride etch process results in a statistically significant improvement in median $\text{T}_1$ by $\sim22\%$ ($p=0.002$), and a reduction in the number of strongly-coupled TLS in the tunable frequency range. Microwave resonator measurements on samples treated with the ammonium fluoride etch prior to niobium deposition also show $\sim33\%$ lower TLS-induced loss tangent compared to the BOE treated samples. As the chemical treatment primarily modifies the Josephson junction-substrate interface and substrate-air interface, we perform targeted chemical and structural characterizations to examine materials' differences at these interfaces and identify multiple microscopic changes that could contribute to decreased TLS.
title Enhanced Superconducting Qubit Performance Through Ammonium Fluoride Etch
topic Materials Science
Quantum Physics
url https://arxiv.org/abs/2408.02863