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| Auteurs principaux: | , , , , |
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| Format: | Preprint |
| Publié: |
2024
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| Sujets: | |
| Accès en ligne: | https://arxiv.org/abs/2408.03642 |
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| _version_ | 1866917743025979392 |
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| author | Broens, Yorick Butler, Hans Kamidi, Ramidin Verkerk, Koen Weiland, Siep |
| author_facet | Broens, Yorick Butler, Hans Kamidi, Ramidin Verkerk, Koen Weiland, Siep |
| contents | Growing demands in the semiconductor industry necessitate increasingly stringent requirements on throughput and positioning accuracy of lithographic equipment. Meeting these demands involves employing highly aggressive motion profiles, which introduce position-dependent flexible dynamics, thus compromising achievable position tracking performance. This paper introduces a control approach enabling active compensation of position-dependent flexible dynamics by extending the conventional rigid-body control structure to include active control of flexible dynamics. To facilitate real-time implementation of the control algorithm, appropriate position-dependent weighting functions are introduced, ensuring computationally efficient execution of the proposed approach. The efficacy of the proposed control design approach is demonstrated through experiments conducted on a state-of-the-art extreme ultraviolet (EUV) wafer stage. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2408_03642 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Active Compensation of Position Dependent Flexible Dynamics in High-Precision Mechatronics Broens, Yorick Butler, Hans Kamidi, Ramidin Verkerk, Koen Weiland, Siep Systems and Control 37M15 J.2; G.2.0 Growing demands in the semiconductor industry necessitate increasingly stringent requirements on throughput and positioning accuracy of lithographic equipment. Meeting these demands involves employing highly aggressive motion profiles, which introduce position-dependent flexible dynamics, thus compromising achievable position tracking performance. This paper introduces a control approach enabling active compensation of position-dependent flexible dynamics by extending the conventional rigid-body control structure to include active control of flexible dynamics. To facilitate real-time implementation of the control algorithm, appropriate position-dependent weighting functions are introduced, ensuring computationally efficient execution of the proposed approach. The efficacy of the proposed control design approach is demonstrated through experiments conducted on a state-of-the-art extreme ultraviolet (EUV) wafer stage. |
| title | Active Compensation of Position Dependent Flexible Dynamics in High-Precision Mechatronics |
| topic | Systems and Control 37M15 J.2; G.2.0 |
| url | https://arxiv.org/abs/2408.03642 |