Influence of Point Defects on Laser-Induced Excitation in Silicon

Fuente: arXiv
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Auteurs principaux: Otobe, Tomohito, Gushiken, Eiyu
Format: Preprint
Publié: 2024
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author Otobe, Tomohito
Gushiken, Eiyu
author_facet Otobe, Tomohito
Gushiken, Eiyu
contents We studied the influence of defect states on the laser excitation process in silicon using time-dependent density functional theory. We assumed two types of point defects: interstitial oxygen and silicon vacancies. We found that the photoabsorption efficiency increased with defect density in both cases owing to the color center. These defects distorted the crystal structure, thereby relaxing the selection rules and changing the indirect gap to direct. At low laser intensities, the defect states dominated the absorption process. However, as the laser intensity increased, the excitation efficiency approached that of crystalline silicon. In addition, we observed that the excitation efficiency did not scale linearly with the pulse length. Notably, in the case of Si vacancies, saturable absorption significantly reduced photoabsorption. Our results suggest that the existence of a defect and its density could be detected by even-order high-harmonics generation.
format Preprint
id arxiv_https___arxiv_org_abs_2408_06560
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Influence of Point Defects on Laser-Induced Excitation in Silicon
Otobe, Tomohito
Gushiken, Eiyu
Materials Science
Applied Physics
We studied the influence of defect states on the laser excitation process in silicon using time-dependent density functional theory. We assumed two types of point defects: interstitial oxygen and silicon vacancies. We found that the photoabsorption efficiency increased with defect density in both cases owing to the color center. These defects distorted the crystal structure, thereby relaxing the selection rules and changing the indirect gap to direct. At low laser intensities, the defect states dominated the absorption process. However, as the laser intensity increased, the excitation efficiency approached that of crystalline silicon. In addition, we observed that the excitation efficiency did not scale linearly with the pulse length. Notably, in the case of Si vacancies, saturable absorption significantly reduced photoabsorption. Our results suggest that the existence of a defect and its density could be detected by even-order high-harmonics generation.
title Influence of Point Defects on Laser-Induced Excitation in Silicon
topic Materials Science
Applied Physics
url https://arxiv.org/abs/2408.06560