Formation of a lateral p-n junction light-emitting diode on an n-type high-mobility GaAs/Al$_{0.33}$Ga$_{0.67}$As heterostructure

Fuente: arXiv
Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Dobney, C. P., Nasir, A., See, P., Ford, C. J. B., Griffiths, J. P., Chen, C., Ritchie, D. A., Kataoka, M.
Format: Preprint
Veröffentlicht: 2024
Schlagworte:
Online-Zugang:
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
_version_ 1866910567650820096
author Dobney, C. P.
Nasir, A.
See, P.
Ford, C. J. B.
Griffiths, J. P.
Chen, C.
Ritchie, D. A.
Kataoka, M.
author_facet Dobney, C. P.
Nasir, A.
See, P.
Ford, C. J. B.
Griffiths, J. P.
Chen, C.
Ritchie, D. A.
Kataoka, M.
contents We have fabricated a device which includes two lateral p-n junctions on an n-type GaAs/Al$_{0.33}$Ga$_{0.67}$As heterostructure. A section of the n-type material has been converted to p-type by removing dopants and applying a voltage to a gate placed in this region. Controlled electroluminescence from both of the p-n junctions has been demonstrated by varying the applied bias voltages. An emission peak with a width of ~8 nm is observed around 812 nm. The electroluminescence seen from both junctions is considered to originate from the GaAs quantum well layer in the device. The lithographic techniques that we have developed are compatible for further integration of gated quantum devices such as single-electron pumps to build on-demand single-photon sources.
format Preprint
id arxiv_https___arxiv_org_abs_2408_08423
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Formation of a lateral p-n junction light-emitting diode on an n-type high-mobility GaAs/Al$_{0.33}$Ga$_{0.67}$As heterostructure
Dobney, C. P.
Nasir, A.
See, P.
Ford, C. J. B.
Griffiths, J. P.
Chen, C.
Ritchie, D. A.
Kataoka, M.
Applied Physics
Mesoscale and Nanoscale Physics
We have fabricated a device which includes two lateral p-n junctions on an n-type GaAs/Al$_{0.33}$Ga$_{0.67}$As heterostructure. A section of the n-type material has been converted to p-type by removing dopants and applying a voltage to a gate placed in this region. Controlled electroluminescence from both of the p-n junctions has been demonstrated by varying the applied bias voltages. An emission peak with a width of ~8 nm is observed around 812 nm. The electroluminescence seen from both junctions is considered to originate from the GaAs quantum well layer in the device. The lithographic techniques that we have developed are compatible for further integration of gated quantum devices such as single-electron pumps to build on-demand single-photon sources.
title Formation of a lateral p-n junction light-emitting diode on an n-type high-mobility GaAs/Al$_{0.33}$Ga$_{0.67}$As heterostructure
topic Applied Physics
Mesoscale and Nanoscale Physics
url https://arxiv.org/abs/2408.08423