Rapid quench annealing of Er implanted Si for quantum networking applications

Fuente: arXiv

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Bibliographic Details
Main Authors:	Hughes, Mark A., Liu, Huan, Brookfield, Adam, Wang, Tianrui, Crowe, Iain F., Dan, Yaping
Format:	Preprint
Published:	2024
Subjects:	Applied Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2408.09470