Rapid quench annealing of Er implanted Si for quantum networking applications
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arXiv
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| Autori principali: | , , , , , |
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| Natura: | Preprint |
| Pubblicazione: |
2024
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| _version_ | 1866913471106383872 |
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| author | Hughes, Mark A. Liu, Huan Brookfield, Adam Wang, Tianrui Crowe, Iain F. Dan, Yaping |
| author_facet | Hughes, Mark A. Liu, Huan Brookfield, Adam Wang, Tianrui Crowe, Iain F. Dan, Yaping |
| contents | Erbium implanted silicon (Er:Si) is a promising platform for quantum networking applications, but a major obstacle is the formation of multiple Er centres. We show that the previously identified cubic centre (Er-C) has C2v or lower symmetry. Using crystal field analysis of Er-C and other Er centres, and by comparison with extended X-ray absorption fine structure (EXAFS) measurements, we show that Er centres can be arranged in a sequence, ranging from entirely Si coordinated, through mixed Si and oxygen (O) coordination, to entirely O coordinated. G-factors calculated from our crystal field fitting closely match those determined by Zeeman splitting and electron paramagnetic resonance (EPR) measurements. We co-implanted Si with Er and O (each to a concentration of 1019 cm-3). By increasing the quenching rate of the subsequent thermal anneal from ~100 °C/s to ~1000 °C/s, we change the dominant optically active centre, formed from Er2O3 clusters to the less energetically favourable Er-C centre with mixed Si and O coordination. Temperature dependent photoluminescence (PL) shows that Er2O3 clusters and Er-C centres have an O-related defect state at ~200 and 90 meV above the 4I13/2 Er manifold, respectively. PL lifetime measurements show that the Er2O3 clusters and Er-C centres fall into two or three classes, characterised by different non-radiative PL decay rates. Our high quench rate annealing process could facilitate the formation of a single, optically active Er centre, which is preferable for quantum networking applications of Er:Si. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2408_09470 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Rapid quench annealing of Er implanted Si for quantum networking applications Hughes, Mark A. Liu, Huan Brookfield, Adam Wang, Tianrui Crowe, Iain F. Dan, Yaping Applied Physics Erbium implanted silicon (Er:Si) is a promising platform for quantum networking applications, but a major obstacle is the formation of multiple Er centres. We show that the previously identified cubic centre (Er-C) has C2v or lower symmetry. Using crystal field analysis of Er-C and other Er centres, and by comparison with extended X-ray absorption fine structure (EXAFS) measurements, we show that Er centres can be arranged in a sequence, ranging from entirely Si coordinated, through mixed Si and oxygen (O) coordination, to entirely O coordinated. G-factors calculated from our crystal field fitting closely match those determined by Zeeman splitting and electron paramagnetic resonance (EPR) measurements. We co-implanted Si with Er and O (each to a concentration of 1019 cm-3). By increasing the quenching rate of the subsequent thermal anneal from ~100 °C/s to ~1000 °C/s, we change the dominant optically active centre, formed from Er2O3 clusters to the less energetically favourable Er-C centre with mixed Si and O coordination. Temperature dependent photoluminescence (PL) shows that Er2O3 clusters and Er-C centres have an O-related defect state at ~200 and 90 meV above the 4I13/2 Er manifold, respectively. PL lifetime measurements show that the Er2O3 clusters and Er-C centres fall into two or three classes, characterised by different non-radiative PL decay rates. Our high quench rate annealing process could facilitate the formation of a single, optically active Er centre, which is preferable for quantum networking applications of Er:Si. |
| title | Rapid quench annealing of Er implanted Si for quantum networking applications |
| topic | Applied Physics |
| url | https://arxiv.org/abs/2408.09470 |