Measurements of dislocations in 4H-SiC with rocking curve imaging

Fuente: arXiv
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Autori principali: Khaliq, Ahmar, Wittwer, Felix, Pyrlik, Niklas, Fevola, Giovanni, Patjens, Svenja, Barp, Jackson, Falkenberg, Gero, Hampel, Sven, Stuckelberger, Michael, Garrevoet, Jan, Bruckner, Dennis, Modregger, Peter
Natura: Preprint
Pubblicazione: 2024
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author Khaliq, Ahmar
Wittwer, Felix
Pyrlik, Niklas
Fevola, Giovanni
Patjens, Svenja
Barp, Jackson
Falkenberg, Gero
Hampel, Sven
Stuckelberger, Michael
Garrevoet, Jan
Bruckner, Dennis
Modregger, Peter
author_facet Khaliq, Ahmar
Wittwer, Felix
Pyrlik, Niklas
Fevola, Giovanni
Patjens, Svenja
Barp, Jackson
Falkenberg, Gero
Hampel, Sven
Stuckelberger, Michael
Garrevoet, Jan
Bruckner, Dennis
Modregger, Peter
contents 4H Silicon Carbide (4H-SiC) combines many attractive properties such as a high carrier mobility, a wide bandgap, and a high thermal conductivity, making it an ideal candidate for high-power electronic devices. However, a primary challenge in utilizing 4H-SiC is the presence of defects in epitaxial layers, which can significantly degrade device performance. In this study, we have used X-ray transmission topography with a rocking curve imaging technique to characterize the types and distribution of defects in 4H-SiC. The derived maps from the fitted Gaussian parameters were used to investigate dislocations in 4H-SiC. Understanding the distribution of the dislocations provides valuable insights into the overall crystal quality, which can guide improvements for the fabrication processes.
format Preprint
id arxiv_https___arxiv_org_abs_2409_00200
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Measurements of dislocations in 4H-SiC with rocking curve imaging
Khaliq, Ahmar
Wittwer, Felix
Pyrlik, Niklas
Fevola, Giovanni
Patjens, Svenja
Barp, Jackson
Falkenberg, Gero
Hampel, Sven
Stuckelberger, Michael
Garrevoet, Jan
Bruckner, Dennis
Modregger, Peter
Materials Science
4H Silicon Carbide (4H-SiC) combines many attractive properties such as a high carrier mobility, a wide bandgap, and a high thermal conductivity, making it an ideal candidate for high-power electronic devices. However, a primary challenge in utilizing 4H-SiC is the presence of defects in epitaxial layers, which can significantly degrade device performance. In this study, we have used X-ray transmission topography with a rocking curve imaging technique to characterize the types and distribution of defects in 4H-SiC. The derived maps from the fitted Gaussian parameters were used to investigate dislocations in 4H-SiC. Understanding the distribution of the dislocations provides valuable insights into the overall crystal quality, which can guide improvements for the fabrication processes.
title Measurements of dislocations in 4H-SiC with rocking curve imaging
topic Materials Science
url https://arxiv.org/abs/2409.00200