The role of sputtered atom and ion energy distribution in films deposited by Physical Vapor Deposition: A molecular dynamics approach

Fuente: arXiv

Saved in:

Bibliographic Details
Main Authors:	Atmane, Soumya, Alexandre, Maroussiak, Caillard, Amaël, Thomann, Anne-Lise, Kateb, Movaffaq, Gudmundsson, Jón Tómas, Brault, Pascal
Format:	Preprint
Published:	2024
Subjects:	Computational Physics Plasma Physics
Online Access:	Acceder al recurso
Tags:	Add Tag No Tags, Be the first to tag this record!

Internet

https://arxiv.org/abs/2409.01049