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The role of sputtered atom and ion energy distribution in films deposited by Physical Vapor Deposition: A molecular dynamics approach

Fuente: arXiv

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Detalles Bibliográficos
Autores principales:	Atmane, Soumya, Alexandre, Maroussiak, Caillard, Amaël, Thomann, Anne-Lise, Kateb, Movaffaq, Gudmundsson, Jón Tómas, Brault, Pascal
Formato:	Preprint
Publicado:	2024
Materias:	Computational Physics Plasma Physics
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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