Optimal decentralized wavelength control in light sources for lithography
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arXiv
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| Format: | Preprint |
| Veröffentlicht: |
2024
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| _version_ | 1866915024119791616 |
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| author | Kashyap, Mruganka |
| author_facet | Kashyap, Mruganka |
| contents | Pulsed light sources are a critical component of modern lithography, with fine light beam wavelength control paramount for wafer etching accuracy. We study optimal wavelength control by casting it as a decentralized linear quadratic Gaussian (LQG) problem in presence of time-delays. In particular, we consider the multi-optics module (optics and actuators) used for generating the requisite wavelength in light sources as cooperatively interacting systems defined over a directed acyclic graph (DAG). We show that any measurement and other continuous time-delays can be exactly compensated, and the resulting optimal controller implementation at the individual optics-level outperforms any existing wavelength control techniques. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2409_04721 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Optimal decentralized wavelength control in light sources for lithography Kashyap, Mruganka Systems and Control Optimization and Control Pulsed light sources are a critical component of modern lithography, with fine light beam wavelength control paramount for wafer etching accuracy. We study optimal wavelength control by casting it as a decentralized linear quadratic Gaussian (LQG) problem in presence of time-delays. In particular, we consider the multi-optics module (optics and actuators) used for generating the requisite wavelength in light sources as cooperatively interacting systems defined over a directed acyclic graph (DAG). We show that any measurement and other continuous time-delays can be exactly compensated, and the resulting optimal controller implementation at the individual optics-level outperforms any existing wavelength control techniques. |
| title | Optimal decentralized wavelength control in light sources for lithography |
| topic | Systems and Control Optimization and Control |
| url | https://arxiv.org/abs/2409.04721 |