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Autores principales: Lee, Changseob, Kwon, Ikhyeon, Samanta, Anirban, Li, Siwei, Yoo, S. J. Ben
Formato: Preprint
Publicado: 2024
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Acceso en línea:https://arxiv.org/abs/2409.07598
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_version_ 1866917774561902592
author Lee, Changseob
Kwon, Ikhyeon
Samanta, Anirban
Li, Siwei
Yoo, S. J. Ben
author_facet Lee, Changseob
Kwon, Ikhyeon
Samanta, Anirban
Li, Siwei
Yoo, S. J. Ben
contents 3T TRAM with doping profile (P+PNPNN+) is experimentally demonstrated on a silicon photonic platform. By using additional implant layers, this device provides excellent memory performance compared to the conventional structure (PNPN). TCAD is used to reflect the physical behavior, and the high-speed memory operations are described through the model.
format Preprint
id arxiv_https___arxiv_org_abs_2409_07598
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle High Performance Three-Terminal Thyristor RAM with a P+/P/N/P/N/N+ Doping Profile on a Silicon-Photonic CMOS Platform
Lee, Changseob
Kwon, Ikhyeon
Samanta, Anirban
Li, Siwei
Yoo, S. J. Ben
Systems and Control
3T TRAM with doping profile (P+PNPNN+) is experimentally demonstrated on a silicon photonic platform. By using additional implant layers, this device provides excellent memory performance compared to the conventional structure (PNPN). TCAD is used to reflect the physical behavior, and the high-speed memory operations are described through the model.
title High Performance Three-Terminal Thyristor RAM with a P+/P/N/P/N/N+ Doping Profile on a Silicon-Photonic CMOS Platform
topic Systems and Control
url https://arxiv.org/abs/2409.07598