Sensitivity of Multislice Electron Ptychography to Point Defects: A Case Study in SiC

Fuente: arXiv

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Bibliographic Details
Main Authors:	Bhat, Aaditya, Gilgenbach, Colin, Kim, Junghwa, Xu, Michael, Zhu, Menglin, LeBeau, James M.
Format:	Preprint
Published:	2024
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2409.07663