Ab Initio Device-Driven Screening of Sub-1-nm Thickness Oxide Semiconductors for Future CMOS Technology Nodes

Fuente: arXiv

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Bibliographic Details
Main Authors:	Xu, Linqiang, Hu, Yue, Xu, Lianqiang, Xu, Lin, Li, Qiuhui, Wang, Aili, Lau, Chit Siong, Lu, Jing, Ang, Yee Sin
Format:	Preprint
Published:	2024
Subjects:	Materials Science Mesoscale and Nanoscale Physics Applied Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2409.08096