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Cryogenic microwave performance of silicon nitride and amorphous silicon deposited using low-temperature ICPCVD

Fuente: arXiv

Enregistré dans:

Détails bibliographiques
Auteurs principaux:	Sun, Jiamin, Shu, Shibo, Chai, Ye, Zhu, Lin, Zhang, Lingmei, Li, Yongping, Liu, Zhouhui, Li, Zhengwei, Xu, Yu, Yan, Daikang, Guo, Weijie, Wang, Yiwen, Liu, Congzhan
Format:	Preprint
Publié:	2024
Sujets:	Instrumentation and Detectors Instrumentation and Methods for Astrophysics
Accès en ligne:	Acceder al recurso
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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