Saved in:
Bibliographic Details
Main Authors: Martínez, E. A., Lucero, A. M., Cantero, E. D., Biškup, N., Orte, A., Sánchez, E. A., Romera, M., Nemes, N. M., Martínez, J. L., Varela, M., Grizzi, O., Bruno, F. Y.
Format: Preprint
Published: 2024
Subjects:
Online Access:https://arxiv.org/abs/2409.11893
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1866910807801987072
author Martínez, E. A.
Lucero, A. M.
Cantero, E. D.
Biškup, N.
Orte, A.
Sánchez, E. A.
Romera, M.
Nemes, N. M.
Martínez, J. L.
Varela, M.
Grizzi, O.
Bruno, F. Y.
author_facet Martínez, E. A.
Lucero, A. M.
Cantero, E. D.
Biškup, N.
Orte, A.
Sánchez, E. A.
Romera, M.
Nemes, N. M.
Martínez, J. L.
Varela, M.
Grizzi, O.
Bruno, F. Y.
contents The two-dimensional electron gas (2DEG) found in KTaO3-based interfaces has garnered attention due to its remarkable electronic properties. In this study, we investigated the conducting system embedded at the Si3N4/Al//KTO(110) heterostructure. We demonstrate that the Al/KTO interface supports a conducting system, with the Si3N4 passivation layer acting as a barrier to oxygen diffusion, enabling ex-situ characterization. Our findings reveal that the mobility and carrier density of the system can be tuned by varying the Al layer thickness. Using scanning transmission electron microscopy, electron energy-loss spectroscopy, X-ray photoemission spectroscopy, and time-of-flight secondary ion mass spectrometry, we characterized the structural and chemical composition of the interface. We found that the Al layer fully oxidizes into AlOx, drawing oxygen from the KTaO3 substrate. The oxygen depletion zone extends 3-5 nm into the substrate and correlates to the Al thickness. Heterostructures with thicker Al layers exhibit higher carrier densities but lower mobilities, likely due to interactions with the oxygen vacancies that act as scattering centers. These findings highlight the importance of considering the effect and extent of the oxygen depletion zone when designing and modeling two-dimensional electron systems in complex oxides.
format Preprint
id arxiv_https___arxiv_org_abs_2409_11893
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle High stability 2D electron gases formed in Si3N4/Al//KTaO3 heterostructures: synthesis and in-depth interfacial characterization
Martínez, E. A.
Lucero, A. M.
Cantero, E. D.
Biškup, N.
Orte, A.
Sánchez, E. A.
Romera, M.
Nemes, N. M.
Martínez, J. L.
Varela, M.
Grizzi, O.
Bruno, F. Y.
Materials Science
Strongly Correlated Electrons
The two-dimensional electron gas (2DEG) found in KTaO3-based interfaces has garnered attention due to its remarkable electronic properties. In this study, we investigated the conducting system embedded at the Si3N4/Al//KTO(110) heterostructure. We demonstrate that the Al/KTO interface supports a conducting system, with the Si3N4 passivation layer acting as a barrier to oxygen diffusion, enabling ex-situ characterization. Our findings reveal that the mobility and carrier density of the system can be tuned by varying the Al layer thickness. Using scanning transmission electron microscopy, electron energy-loss spectroscopy, X-ray photoemission spectroscopy, and time-of-flight secondary ion mass spectrometry, we characterized the structural and chemical composition of the interface. We found that the Al layer fully oxidizes into AlOx, drawing oxygen from the KTaO3 substrate. The oxygen depletion zone extends 3-5 nm into the substrate and correlates to the Al thickness. Heterostructures with thicker Al layers exhibit higher carrier densities but lower mobilities, likely due to interactions with the oxygen vacancies that act as scattering centers. These findings highlight the importance of considering the effect and extent of the oxygen depletion zone when designing and modeling two-dimensional electron systems in complex oxides.
title High stability 2D electron gases formed in Si3N4/Al//KTaO3 heterostructures: synthesis and in-depth interfacial characterization
topic Materials Science
Strongly Correlated Electrons
url https://arxiv.org/abs/2409.11893