Data-driven surrogate model for etch rate profiles using sensor data from a reactive ion etcher

Fuente: arXiv

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Bibliographic Details
Main Authors:	Pamarty, Abhijit Pranav, Neuweiler, Robert, Do, Le Quyen, Johnson, Keaton, Sanchez, James J., Koli, Dinesh
Format:	Preprint
Published:	2024
Subjects:	Computational Engineering, Finance, and Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2409.12925