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Auteurs principaux: Wang, Sijia, Wang, Chen, Zhao, Zhenhao, Zhang, Jiqiang, Cai, Weiran
Format: Preprint
Publié: 2024
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Accès en ligne:https://arxiv.org/abs/2409.14014
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author Wang, Sijia
Wang, Chen
Zhao, Zhenhao
Zhang, Jiqiang
Cai, Weiran
author_facet Wang, Sijia
Wang, Chen
Zhao, Zhenhao
Zhang, Jiqiang
Cai, Weiran
contents Molecular conformation generation poses a significant challenge in the field of computational chemistry. Recently, Diffusion Probabilistic Models (DPMs) and Score-Based Generative Models (SGMs) are effectively used due to their capacity for generating accurate conformations far beyond conventional physics-based approaches. However, the discrepancy between training and inference rises a critical problem known as the exposure bias. While this issue has been extensively investigated in DPMs, the existence of exposure bias in SGMs and its effective measurement remain unsolved, which hinders the use of compensation methods for SGMs, including ConfGF and Torsional Diffusion as the representatives. In this work, we first propose a method for measuring exposure bias in SGMs used for molecular conformation generation, which confirms the significant existence of exposure bias in these models and measures its value. We design a new compensation algorithm Input Perturbation (IP), which is adapted from a method originally designed for DPMs only. Experimental results show that by introducing IP, SGM-based molecular conformation models can significantly improve both the accuracy and diversity of the generated conformations. Especially by using the IP-enhanced Torsional Diffusion model, we achieve new state-of-the-art performance on the GEOM-Drugs dataset and are on par on GEOM-QM9. We provide the code publicly at https://github.com/jia-975/torsionalDiff-ip.
format Preprint
id arxiv_https___arxiv_org_abs_2409_14014
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Mitigating Exposure Bias in Score-Based Generation of Molecular Conformations
Wang, Sijia
Wang, Chen
Zhao, Zhenhao
Zhang, Jiqiang
Cai, Weiran
Machine Learning
Artificial Intelligence
Biomolecules
Molecular conformation generation poses a significant challenge in the field of computational chemistry. Recently, Diffusion Probabilistic Models (DPMs) and Score-Based Generative Models (SGMs) are effectively used due to their capacity for generating accurate conformations far beyond conventional physics-based approaches. However, the discrepancy between training and inference rises a critical problem known as the exposure bias. While this issue has been extensively investigated in DPMs, the existence of exposure bias in SGMs and its effective measurement remain unsolved, which hinders the use of compensation methods for SGMs, including ConfGF and Torsional Diffusion as the representatives. In this work, we first propose a method for measuring exposure bias in SGMs used for molecular conformation generation, which confirms the significant existence of exposure bias in these models and measures its value. We design a new compensation algorithm Input Perturbation (IP), which is adapted from a method originally designed for DPMs only. Experimental results show that by introducing IP, SGM-based molecular conformation models can significantly improve both the accuracy and diversity of the generated conformations. Especially by using the IP-enhanced Torsional Diffusion model, we achieve new state-of-the-art performance on the GEOM-Drugs dataset and are on par on GEOM-QM9. We provide the code publicly at https://github.com/jia-975/torsionalDiff-ip.
title Mitigating Exposure Bias in Score-Based Generation of Molecular Conformations
topic Machine Learning
Artificial Intelligence
Biomolecules
url https://arxiv.org/abs/2409.14014