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Main Authors: de Almeida, G. G., de Andrade, A. M. H., Tumelero, M. A.
Format: Preprint
Published: 2024
Subjects:
Online Access:https://arxiv.org/abs/2409.17444
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author de Almeida, G. G.
de Andrade, A. M. H.
Tumelero, M. A.
author_facet de Almeida, G. G.
de Andrade, A. M. H.
Tumelero, M. A.
contents The Bi1-xSbx was the first 3D topological insulator found in nature. It presents a complex electronic structure with topological to trivial transition and a semimetallic to semiconductor transition, both achieved by changing the x fraction of Sb. The complex nature of this system may lead to several electronic and topological phases in matter, making it a promising quantum material. Here, we focused on preparing very high-quality thin films samples of Bi1-xSbx with varying fraction of x using the Co-deposition Magnetron Sputtering technique. Our results demonstrate that high-quality samples, with compact and uniform morphology, presenting a preferential direction of growth, can be obtained over SiO2 substrate. Our findings suggest a dependence between the thin films crystalline texture and the composition of the samples, as well as the deposition temperature.
format Preprint
id arxiv_https___arxiv_org_abs_2409_17444
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Preparation and Characterization of High Quality Bi1-xSbx Thin Films: A Sputtering Deposition Approach
de Almeida, G. G.
de Andrade, A. M. H.
Tumelero, M. A.
Materials Science
The Bi1-xSbx was the first 3D topological insulator found in nature. It presents a complex electronic structure with topological to trivial transition and a semimetallic to semiconductor transition, both achieved by changing the x fraction of Sb. The complex nature of this system may lead to several electronic and topological phases in matter, making it a promising quantum material. Here, we focused on preparing very high-quality thin films samples of Bi1-xSbx with varying fraction of x using the Co-deposition Magnetron Sputtering technique. Our results demonstrate that high-quality samples, with compact and uniform morphology, presenting a preferential direction of growth, can be obtained over SiO2 substrate. Our findings suggest a dependence between the thin films crystalline texture and the composition of the samples, as well as the deposition temperature.
title Preparation and Characterization of High Quality Bi1-xSbx Thin Films: A Sputtering Deposition Approach
topic Materials Science
url https://arxiv.org/abs/2409.17444