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Atomically Flat Dielectric Patterns for Band Gap Engineering and Lateral Junction Formation in MoSe$_2$ Monolayers

Fuente: arXiv
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Bibliographic Details
Main Authors: Moser, Philipp, Wolz, Lukas M., Henning, Alex, Thurn, Andreas, Kuhl, Matthias, Ji, Peirui, Soubelet, Pedro, Schalk, Martin, Eichhorn, Johanna, Sharp, Ian D., Stier, Andreas V., Finley, Jonathan J.
Format: Preprint
Published: 2024
Subjects:
Materials Science
Mesoscale and Nanoscale Physics
Online Access:
Acceder al recurso
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