Reducing disorder in Ge quantum wells by using thick SiGe barriers

Fuente: arXiv

Saved in:

Bibliographic Details
Main Authors:	Costa, Davide, Stehouwer, Lucas E. A., Huang, Yi, Martí-Sánchez, Sara, Esposti, Davide Degli, Arbiol, Jordi, Scappucci, Giordano
Format:	Preprint
Published:	2024
Subjects:	Mesoscale and Nanoscale Physics Materials Science
Online Access:	Acceder al recurso
Tags:	Add Tag No Tags, Be the first to tag this record!

Internet

https://arxiv.org/abs/2410.03256