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Main Authors: Pandey, Nilesh, Basu, Dipanjan, Chauhan, Yogesh Singh, Register, Leonard F., Banerjee, Sanjay K.
Format: Preprint
Published: 2024
Subjects:
Online Access:https://arxiv.org/abs/2410.04339
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_version_ 1866914965795897344
author Pandey, Nilesh
Basu, Dipanjan
Chauhan, Yogesh Singh
Register, Leonard F.
Banerjee, Sanjay K.
author_facet Pandey, Nilesh
Basu, Dipanjan
Chauhan, Yogesh Singh
Register, Leonard F.
Banerjee, Sanjay K.
contents This study employs advanced phase-field modeling to investigate Si-based qubit MOSFETs, integrating electrostatics and quantum mechanical effects. We adopt a comprehensive modeling approach, utilizing full-wave treatment of the Schrodinger equation solutions, coupled with the Poisson equation at cryogenic temperatures. Our analysis explores the influence of interface traps on quantum dot (QD) barrier heights, affecting coupling due to tunneling. A wider trap distribution leads to the decoupling of quantum dots. Furthermore, the oscillations in the transmission and reflection coefficients increase as the plunger/barrier gate length increases, reducing the coupling between the QDs. By optimizing plunger and barrier gate dimensions, spacer configurations, and gap oxide lengths, we enhance control over quantum well depths and minimize unwanted wave function leakage. The modeling algorithm is also validated against the experimental data and can accurately capture the oscillations in the Id Vgs caused by the Coulomb blockade at cryogenic temperature
format Preprint
id arxiv_https___arxiv_org_abs_2410_04339
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Engineering Si-Qubit MOSFETs: A Phase-Field Modeling Approach Integrating Quantum-Electrostatics at Cryogenic Temperatures
Pandey, Nilesh
Basu, Dipanjan
Chauhan, Yogesh Singh
Register, Leonard F.
Banerjee, Sanjay K.
Quantum Physics
This study employs advanced phase-field modeling to investigate Si-based qubit MOSFETs, integrating electrostatics and quantum mechanical effects. We adopt a comprehensive modeling approach, utilizing full-wave treatment of the Schrodinger equation solutions, coupled with the Poisson equation at cryogenic temperatures. Our analysis explores the influence of interface traps on quantum dot (QD) barrier heights, affecting coupling due to tunneling. A wider trap distribution leads to the decoupling of quantum dots. Furthermore, the oscillations in the transmission and reflection coefficients increase as the plunger/barrier gate length increases, reducing the coupling between the QDs. By optimizing plunger and barrier gate dimensions, spacer configurations, and gap oxide lengths, we enhance control over quantum well depths and minimize unwanted wave function leakage. The modeling algorithm is also validated against the experimental data and can accurately capture the oscillations in the Id Vgs caused by the Coulomb blockade at cryogenic temperature
title Engineering Si-Qubit MOSFETs: A Phase-Field Modeling Approach Integrating Quantum-Electrostatics at Cryogenic Temperatures
topic Quantum Physics
url https://arxiv.org/abs/2410.04339