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Control of Cu morphology on TaN barrier and combined Ru-TaN barrier/liner substrates for nanoscale interconnects from atomistic kinetic Monte Carlo simulations

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Bibliographic Details
Main Authors:	Aldana, Samuel, Nies, Cara-Lena, Nolan, Michael
Format:	Preprint
Published:	2024
Subjects:	Materials Science Chemical Physics Computational Physics
Online Access:	Acceder al recurso
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